Design and fabrication of UVLED array aligner for proximity and soft contact exposure

Jiun-Woei Huang

doi:10.1117/12.2551568

23 March 2020 Design and fabrication of UVLED array aligner for proximity and soft contact exposure

Jiun-Woei Huang

Proceedings Volume 11327, Optical Microlithography XXXIII; 113270Z (2020) https://doi.org/10.1117/12.2551568
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

UVLED array aligner for proximity and soft contact exposure has been designed and fabricated. The source is designed for a lithography aligner, each UVLED is arranged in a plate with equal space to form UVLED array source. With AAAAS illumination optics, the aligner is built and has provided the uniformly source. 12 inches wafer with 0.6 micron mask for TSV process has proved in soft contact and proximity exposure modes, with less 1 microns for soft contact. 20 microns for 100 microns proximity exposure, with deviation of 1 micron.

Citation Download Citation

Jiun-Woei Huang "Design and fabrication of UVLED array aligner for proximity and soft contact exposure", Proc. SPIE 11327, Optical Microlithography XXXIII, 113270Z (23 March 2020); https://doi.org/10.1117/12.2551568

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