Simulation of polychromatic effects in high NA EUV lithography

Andreas Erdmann; Hazem Mesilhy; Peter Evanschitzky; Qais Saadeh; Victor Soltwisch; Simon Bihr; Jörg Zimmermann; Vicky Philipsen

doi:10.1117/12.2600931

12 October 2021 Simulation of polychromatic effects in high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Qais Saadeh, Victor Soltwisch, Simon Bihr, Jörg Zimmermann, Vicky Philipsen

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 1185405 (2021) https://doi.org/10.1117/12.2600931
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

State-of-the-art EUV exposure systems utilize EUV radiation around 13.52 nm with a full band spectrum extend- ing from 13.2 nm to 13.8 nm. The variation of the wavelength in this range modifies the diffraction angles with an impact on the image blur and non-telecentricity effects. Dispersion of the materials on the EUV mirrors and on the 3D mask introduce an additional sensitivity of the imaging characteristics to the exposure wavelength. We employed the simulation models of the Fraunhofer IISB lithography simulator Dr.LiTHO in combination with measured optical material data from PTB to quantify the resulting image impact and to differentiate between the identified contributors to polychromatic imaging effects.

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Citation Download Citation

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Qais Saadeh, Victor Soltwisch, Simon Bihr, Jörg Zimmermann, and Vicky Philipsen "Simulation of polychromatic effects in high NA EUV lithography", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 1185405 (12 October 2021); https://doi.org/10.1117/12.2600931

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