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20 December 2022 Recent advances of laser interference lithography
Xinghui Li
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Proceedings Volume 12318, Holography, Diffractive Optics, and Applications XII; 123180I (2022) https://doi.org/10.1117/12.2644116
Event: SPIE/COS Photonics Asia, 2022, Online Only
Abstract
This review starts from various demands on periodic microstructures array in nanoscience and nanoengineering, such as photon crystal, diffraction gratings, and framework for self-assembly, to various nanofabrication technologies including mask based and maskless lithography, direct writing using EB, FIB or ultra-fast laser, and ultra-precision single diamond cutting. In the second part, the most proper technology for patterning microstructures abovementioned, laser interference lithography (LIL), is introduced. Fundamentals of the LIL is briefly presented and followed by an intensive survey of recent advances in LIL field. Laser sources, interferometer layouts, strategies for forming complex structures, integration of LIL with other fabrication technologies, and promising application areas for LIL are reviewed step by step.
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Xinghui Li "Recent advances of laser interference lithography", Proc. SPIE 12318, Holography, Diffractive Optics, and Applications XII, 123180I (20 December 2022); https://doi.org/10.1117/12.2644116
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KEYWORDS
Lithography
Nanoengineering
Nanofabrication
Nanotechnology
Optical lithography
Photomasks
Photonic crystal devices
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