Presentation
30 April 2023 Verification methods for curvilinear and real-curve geometries
Author Affiliations +
Abstract
Curvilinear layout data has been used for better mask quality for ILT OPC results, but it has issues such as complexity, huge data volume and absence of established verification methods. In this presentation, fundamental and practical verification methods will be discussed for complicated curvilinear geometries. On top of that, real curve data (parametric curves) has been discussed to reduce the mask data volume. The MULTIGON record has been defined as the real curve expression. We will explain the characteristics of the new record and show the outlook about how the mask industry should deal with its complexity.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato "Verification methods for curvilinear and real-curve geometries", Proc. SPIE 12495, DTCO and Computational Patterning II, 124950J (30 April 2023); https://doi.org/10.1117/12.2661609
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KEYWORDS
Photomasks

Data processing

Distance measurement

Lithography

Manufacturing

Optical proximity correction

Semiconductor manufacturing

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