Dr. Kokoro Kato
Project Manager/Sales Representative at Synopsys
SPIE Involvement:
Author | Editor
Publications (29)

Proceedings Article | 12 November 2024 Presentation + Paper
Kokoro Kato, Satoshi Mitsuno, Kuninori Nishizawa, Ken Kuo, Johnny Yeap, J. Jou
Proceedings Volume 13216, 132161L (2024) https://doi.org/10.1117/12.3034562
KEYWORDS: Computed tomography, Optical proximity correction, Semiconductor manufacturing, Mathematical optimization, Manufacturing, Data processing, Standards development, Semiconductors, Semiconducting wafers, Photomasks

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 124950J (2023) https://doi.org/10.1117/12.2661609
KEYWORDS: Photomasks, Vestigial sideband modulation, Semiconductors, Semiconductor manufacturing, Optical proximity correction, Manufacturing, Lithography, Distance measurement, Data processing

Proceedings Article | 15 September 2022 Presentation
Proceedings Volume PC12325, PC123250D (2022) https://doi.org/10.1117/12.2656142

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481K (2019) https://doi.org/10.1117/12.2538626
KEYWORDS: Process modeling, Manufacturing, Algorithm development, Software development, Photomasks, Optical proximity correction, Time metrology

Proceedings Article | 28 June 2013 Paper
Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa
Proceedings Volume 8701, 87010C (2013) https://doi.org/10.1117/12.2027851
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Fuzzy logic, Data processing, Mirrors, Semiconducting wafers, Electronic design automation, Critical dimension metrology, Nanotechnology

Showing 5 of 29 publications
Proceedings Volume Editor (3)

Conference Committee Involvement (8)
Photomask Japan 2014
15 April 2014 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XX
16 April 2013 | Yokohama, Japan
Photomask Japan 2012
17 April 2012 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Showing 5 of 8 Conference Committees
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