Chemically amplified resists for I-line and G-line applications

Amanda K. Berry; Wayne E. Feely; Stephen D. Thompson; Gary S. Calabrese; Roger F. Sinta; Angelo A. Lamola; James W. Thackeray; George W. Orsula

doi:10.1117/12.20113

1 June 1990 Chemically amplified resists for I-line and G-line applications

Amanda K. Berry, Wayne E. Feely, Stephen D. Thompson, Gary S. Calabrese, Roger F. Sinta, Angelo A. Lamola, James W. Thackeray, George W. Orsula

Author Affiliations +

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20113
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

This paper describes the evaluation of several phenothiazine and benzophenothiazine derivatives which are useful as i-line and g-line photosensitizers for a class of chemically amplified crosslinked resists. Data supporting an electron transfer mechanism of sensitization from the excited state of the sensitizer to the acid generator are provided. Initial lithographic screening demonstrates the potential for both high sensitivity and submicron resolution in these systems.

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Amanda K. Berry, Wayne E. Feely, Stephen D. Thompson, Gary S. Calabrese, Roger F. Sinta, Angelo A. Lamola, James W. Thackeray, and George W. Orsula "Chemically amplified resists for I-line and G-line applications", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20113

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