Status and outlook of EUV optics at ZEISS

Jörg Zimmermann; Jens Timo Neumann; Dirk Jürgens; Paul Gräupner

doi:10.1117/12.2687658

21 November 2023 Status and outlook of EUV optics at ZEISS

Jörg Zimmermann, Jens Timo Neumann, Dirk Jürgens, Paul Gräupner

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500O (2023) https://doi.org/10.1117/12.2687658
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

The EUV lithography optics program continues to enable the progress of the semiconductor roadmap with higher productivity and finer imaging resolution. ZEISS Starlith® lithography optics systems with a numerical aperture (NA) of 0.33 and an optical resolution of 13 nm half-pitch are being produced in high volume for integration into ASML´s NXE scanners, which have established themselves as industry workhorses in leading edge semiconductor manufacturing. Even finer imaging resolution will be achieved with the Starlith® 5000 for ASML´s EXE scanners, with NA = 0.55 and an optical resolution of 8 nm half-pitch, with highly flexible illumination and an anamorphic projection optics featuring a central obscuration. The first Starlith® 5000 illuminator and projection optics box have been delivered to ASML. The outlook includes future roadmap extensions for low-k₁ imaging at increased productivity and potential further improvements of the single exposure resolution capabilities.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jörg Zimmermann, Jens Timo Neumann, Dirk Jürgens, and Paul Gräupner "Status and outlook of EUV optics at ZEISS", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500O (21 November 2023); https://doi.org/10.1117/12.2687658

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KEYWORDS

EUV optics

Optics manufacturing

High volume manufacturing

Imaging systems

Optical resolution

Scanners

Manufacturing

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