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21 November 2023 A formulation of mask optimization into QUBO model for Ising machines
Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama
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Proceedings Volume 12751, Photomask Technology 2023; 127511D (2023) https://doi.org/10.1117/12.2687615
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States
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Abstract
Recently, Ising machines, which solve Quadratic Unconstrained Binary Optimization (QUBO) problems in a short computation time, have attracted attention. In this paper, we propose a mask optimization method using an Ising machine to obtain a mask with high fidelity to target patterns and high tolerance to process variation. In the proposed method, a mask pattern is improved by repeatedly solving QUBO problems by the Ising machine. In experiments, we applied the proposed method using the Ising machine to various patterns and evaluated it in comparison with existing methods in fidelity to target patterns, tolerance to process variation, and execution time.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, and Chikaaki Kodama "A formulation of mask optimization into QUBO model for Ising machines", Proc. SPIE 12751, Photomask Technology 2023, 127511D (21 November 2023); https://doi.org/10.1117/12.2687615
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KEYWORDS
Source mask optimization
Tolerancing
Optical proximity correction
Semiconducting wafers
SRAF
Quantum annealing
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