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The demand for photomasks in the 45 nm and 65 nm technology nodes is projected to grow steadily in coming years, driven by technological advancements in sectors such as the Internet of Things and autonomous driving. Control over mask production costs especially for the above-mentioned mature nodes plays a crucial role for this mature market segment, creating a high demand for effective and future-proof mask making solutions. In this paper, we present the concept and first data of a new photomask repair platform targeting the mature market segment, e.g., for the technology nodes down to 45 nm: the MeRiT® MG neo. This repair tool has a newly developed platform that incorporates knowledge and industry experience from more than ten years of high-end node repair technology, i.e. from our MeRiT platform. We show that its modular design enables compact tool footprint, high productivity, and excellent serviceability. We present experimental data demonstrating excellent repair performance and reproducibility for opaque and clear defects on PSM, COG and OMOG photomasks. In addition, the modular SW architecture allows a monitoring of process relevant machine data parameter and leads to a high level of automation. To sum up, the MeRiT MG neo is a future-proof and highly cost-of-technology-optimized solution for the mature market.
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