Research of Cr2O3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices

Hong Deng; Xiang Dong Wang; Lei Yuan

doi:10.1117/12.47262

1 November 1991 Research of Cr₂O₃ thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices

Hong Deng, Xiang Dong Wang, Lei Yuan

Author Affiliations +

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47262
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

Formation of chrome oxide thin film on an iron substrate by arc discharge plasma as a heat- radiation absorbent in electric vacuum devices is described. Only oxygen as reaction gas without argon is applied in the discharge chamber and an improved film with good properties is obtained.

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Hong Deng, Xiang Dong Wang, and Lei Yuan "Research of Cr₂O₃ thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47262

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