Practical tolerancing and performance implications for XUV projection lithography reduction systems (Poster Paper)

Vriddhachalam K. Viswanathan

doi:10.1117/12.136045

9 July 1992 Practical tolerancing and performance implications for XUV projection lithography reduction systems (Poster Paper)

Vriddhachalam K. Viswanathan

Author Affiliations +

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136045
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Practical considerations that will strongly affect the imaging capabilities of reflecting systems for extreme-ultraviolet (XUV) projection lithography include manufacturing tolerances and thermal distortion of the mirror surfaces due to absorption of a fraction of the incident radiation beam. We have analyzed the potential magnitudes of these effects for two types of reflective projection optical designs. We find that concentric, symmetric two-mirror systems are less sensitive to manufacturing errors and thermal distortion than off-axis, four-mirror systems.

Citation Download Citation

Vriddhachalam K. Viswanathan "Practical tolerancing and performance implications for XUV projection lithography reduction systems (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136045

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