Vector aerial image with off-axis illumination

Eytan Barouch; Daniel C. Cole; Uwe Hollerbach; Steven A. Orszag

doi:10.1117/12.150463

8 August 1993 Vector aerial image with off-axis illumination

Eytan Barouch, Daniel C. Cole, Uwe Hollerbach, Steven A. Orszag

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150463
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

As the numerical aperture (NA) in optical projection systems increases, the vector nature of the projected electric and magnetic fields becomes more important. Recent advances in off- axis illumination, tilting condenser lenses, and applying spatial filters, as well as phase-shift masks, hold the potential of increased depth of focus. To simulate these techniques in the high- NA regime, we have developed new fast algorithms. The development reported here builds on our recent work (1) extending scalar aerial imaging. The systematic treatment of (1) has now been applied to account for the vector nature of light.

Citation Download Citation

Eytan Barouch, Daniel C. Cole, Uwe Hollerbach, and Steven A. Orszag "Vector aerial image with off-axis illumination", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150463

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available