Paper
4 January 1995 Characterization of vertical GaAs optically activated switches
Nicolas C. Anderson, Christopher R. Spikings, Nigel Seddon
Author Affiliations +
Proceedings Volume 2343, Optically Activated Switching IV; (1995) https://doi.org/10.1117/12.198654
Event: Photonics for Industrial Applications, 1994, Boston, MA, United States
Abstract
In this paper we report on the experimentation conducted on vertical optically activated switches fabricated from GaAs grown by Liquid Encapsulated Czochralski (LEC) and Vertical Gradient Freeze (VGF) techniques. Heavily doped contact regions have been grown on the bulk GaAs to form n+-SI GaAs-n+ and p+-SI GaAs-n+ structures. Dark dc I-V characterization has been used to assess the voltage withstand characteristics of the devices demonstrating 3.5 kV hold-off for reverse biased LEC and VGF p+-SI GaAs-n+ devices. Optical activation has achieved a 1 ns switch closure time with VGF p+-SI GaAs-n+ devices reverse biased at 7 kV and 2 ns switch closure times for VGF n+-SI GaAs-n+ devices biased at 4.5 kV. The voltage drop across the optically activated switches was characterized in terms of two components; a constant and a resistive voltage drop.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicolas C. Anderson, Christopher R. Spikings, and Nigel Seddon "Characterization of vertical GaAs optically activated switches", Proc. SPIE 2343, Optically Activated Switching IV, (4 January 1995); https://doi.org/10.1117/12.198654
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KEYWORDS
Switches

Gallium arsenide

Switching

Semiconducting wafers

Resistance

Wafer-level optics

Metals

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