Photolithographiy transfer setup for periodic and nonperiodic masks

Michel Neviere; Frederic Montiel; Olivier M. Parriaux

doi:10.1117/12.221218

22 September 1995 Photolithography transfer setup for periodic and nonperiodic masks

Michel Neviere, Frederic Montiel, Olivier M. Parriaux

Proceedings Volume 2532, Application and Theory of Periodic Structures; (1995) https://doi.org/10.1117/12.221218
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Using the modal theory of perfectly conducting and finite conductivity lamellar gratings adapted to stratified media encountered in photolithographic transfer set-ups, we investigate a mounting patented 15 years ago and designed to obtain a faithful reproduction of a masks pierced with periodically distributed slits. We make a systematic study of the influence of the various parameters (incidence, mark-space ratio, groove spacing, groove depth, polarization, conductivity of the metal) on the field map below the mask. We discover a large tolerance over the parameters around the values stated in the patent. The result is that the set-up described in the patent can be used for duplicating non-periodic masks (e. g. linear Fresnel zone plates) as well as chirped gratings or gratings with non rectilinear grooves. Experiments have confirmed that predictions. Keywords: Grating mask transfer; Photolithography.

Citation Download Citation

Michel Neviere, Frederic Montiel, and Olivier M. Parriaux "Photolithography transfer setup for periodic and nonperiodic masks", Proc. SPIE 2532, Application and Theory of Periodic Structures, (22 September 1995); https://doi.org/10.1117/12.221218

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KEYWORDS

Chromium

Photomasks

Patents

Diffraction gratings

Glasses

Tolerancing

Integrated optics

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