Efficient workstation-based 3D model for optical alignment simulation

Kevin D. Lucas; Chi-Min Yuan; Andrzej J. Strojwas

doi:10.1117/12.240139

21 May 1996 Efficient workstation-based 3D model for optical alignment simulation

Kevin D. Lucas, Chi-Min Yuan, Andrzej J. Strojwas

Author Affiliations +

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240139
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A new workstation-based rigorous 3D model for simulation of light scattering by alignment structures is introduced. The model extends a successful 2D lithography model, and has been applied to the simulation of periodic 3D alignment marks on a resist covered silicon substrate. The theory behind the new model is presented, and examples are given of the model's results and computational efficiency.

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Kevin D. Lucas, Chi-Min Yuan, and Andrzej J. Strojwas "Efficient workstation-based 3D model for optical alignment simulation", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240139

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