Performance data obtained on a next-generation mask metrology tool

Klaus-Dieter Roeth; Carola Blaesing-Bangert

doi:10.1117/12.240127

21 May 1996 Performance data obtained on a next-generation mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240127
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A new mask and wafer metrology tool is under final development at Leica and will be launched in 1996. The new technical concept is discussed. Recent performance data on the LMS IPRO system at Leica's development center shows precision and accuracy data required for the 0.18 micrometer design rule device generation.

Citation Download Citation

Klaus-Dieter Roeth and Carola Blaesing-Bangert "Performance data obtained on a next-generation mask metrology tool", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240127

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