This will count as one of your downloads.
You will have access to both the presentation and article (if available).
Finding hundreds of relevant patterns in a database containing billions of polygons may be possible, but in addition, it is mandatory to create the complete metrology job fast and reliable. Combining, on one hand, a software expertise in mask databases processing and, on the other hand, advanced skills in control and registration equipment, we have developed a Mask Dataprep Station able to select an appropriate number of measurement targets and their positions in a huge database and automatically create measurement jobs on the corresponding area on the mask for the registration metrology system. In addition, the required design clips are generated from the database in order to perform the rendering procedure on the metrology system.
This new methodology has been validated on real production line for the most advanced process. This paper presents the main challenges that we have faced, as well as some results on the global performances.
However, measuring mask registration performance accurately on tilted lines was a challenge. KLA Tencor applied the model-based algorithm to enable the accurate registration measurement of tilted lines on the Poly layer as well as the mask-to-mask overlay to the adjacent contact layers. The metrology solution is discussed and measurement results are provided.
View contact details
No SPIE Account? Create one
