Computer-enhanced photon tunneling microscopy for surface characterization of optical materials

James D. Kleinmeyer; J. Derek Demaree

doi:10.1117/12.274286

13 May 1997 Computer-enhanced photon tunneling microscopy for surface characterization of optical materials

James D. Kleinmeyer, J. Derek Demaree

Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274286
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

Surface characterization of optical materials is a time consuming and complex process. The complexity of these materials provides a challenging task for determining the effects of such factors as polishing, surface defects, subsurface fracture and variations in optical surface coatings. Our laboratory has incorporated several types of non-intrusive techniques for surface analysis and sample characterization. The newest and one of the most promising techniques is Computer Enhanced Photon Tunneling Microscopy. This paper describes our current photon tunneling microscopy (PTM) system and its use in the characterization of the surface topography of ion-implanted optical sapphire. Examination of implanted surfaces by PTM can be used to determine the amount of material removed by ion sputtering as well as the roughening of the surface by the implantation.

Citation Download Citation

James D. Kleinmeyer and J. Derek Demaree "Computer-enhanced photon tunneling microscopy for surface characterization of optical materials", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274286

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