Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Juha T. Rantala; R. Scott Penner; Seppo Honkanen; Nina Nordman; Olli Nordman; Jouko Vaehaekangas; Mahmoud Fallahi; Nasser Peyghambarian

doi:10.1117/12.312923

6 July 1998 Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Juha T. Rantala, R. Scott Penner, Seppo Honkanen, Nina Nordman, Olli Nordman, Jouko Vaehaekangas, Mahmoud Fallahi, Nasser Peyghambarian

Author Affiliations +

Proceedings Volume 3469, Organic-Inorganic Hybrid Materials for Photonics; (1998) https://doi.org/10.1117/12.312923
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

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Juha T. Rantala, R. Scott Penner, Seppo Honkanen, Nina Nordman, Olli Nordman, Jouko Vaehaekangas, Mahmoud Fallahi, and Nasser Peyghambarian "Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics", Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); https://doi.org/10.1117/12.312923

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