Paper
1 April 1999 1.55-um Er-doped GaN LED
Hongen Shen, Jagadeesh Pamulapati, Monica Alba Taysing-Lara, M. C. Wood, Richard T. Lareau, Matthew H. Ervin, John Devin Mackenzie, Fan Ren, Corinne R. Abernathy, John M. Zavada
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Abstract
Erbium (Er) doped semiconductors are of interest for light- emitting device applications operating at around 1.55 micrometers and for the potential integration with other semiconductor devices. However, the optical emission of Er3+ ions in semiconductors has not been as efficient as in dielectric materials, particularly at room temperature. This may be because ionic bonds, which are characteristic of dielectrics, are better suited for forming the required Er3+ energy levels than are covalent bonds, which are present in most III-V semiconductors. In this paper, we report 1.55 micrometers emission from an Er-doped GaN LED. We also discuss effect of the measurement temperature on the emission spectrum as well as the effect of sample annealing on the emission spectrum.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hongen Shen, Jagadeesh Pamulapati, Monica Alba Taysing-Lara, M. C. Wood, Richard T. Lareau, Matthew H. Ervin, John Devin Mackenzie, Fan Ren, Corinne R. Abernathy, and John M. Zavada "1.55-um Er-doped GaN LED", Proc. SPIE 3622, Rare-Earth-Doped Materials and Devices III, (1 April 1999); https://doi.org/10.1117/12.344498
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KEYWORDS
Erbium

Gallium nitride

Silicon

Semiconductors

Electroluminescence

Annealing

Dielectrics

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