Thermomechanical distortions of advanced optical reticles during exposure

Jaehyuk Chang; Amr Y. Abdo; Byung-Kyu Kim; Theodore M. Bloomstein; Roxann L. Engelstad; Edward G. Lovell; William A. Beckman; John W. Mitchell

doi:10.1117/12.351144

25 June 1999 Thermomechanical distortions of advanced optical reticles during exposure

Jaehyuk Chang, Amr Y. Abdo, Byung-Kyu Kim, Theodore M. Bloomstein, Roxann L. Engelstad, Edward G. Lovell, William A. Beckman, John W. Mitchell

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351144
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

If optical lithography is to be extended into the 157 nm regime, controlling mask-related distortions will be a necessity. Thermomechanical distortions during exposure could be a major source of pattern placement error, especially if alternative materials such as CaF₂ or MgF₂ are employed. Full 3D finite element heat transfer and structural models have been developed to simulate the response of the reticle during both full-field and scanning exposure systems. Transient and periodic steady-state temperature distributions have been determined for typical exposure duty cycles. Corresponding in-plane and out-of- plane thermal distortions have been identified for both fused silica and calcium fluoride substrates. Under equivalent exposure conditions, the distortions in the CaF₂ are significantly higher.

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Jaehyuk Chang, Amr Y. Abdo, Byung-Kyu Kim, Theodore M. Bloomstein, Roxann L. Engelstad, Edward G. Lovell, William A. Beckman, and John W. Mitchell "Thermomechanical distortions of advanced optical reticles during exposure", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351144

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