Liquid-target laser-plasma sources for EUV and x-ray lithography

Hans M. Hertz; Magnus Berglund; Bjoern A. M. Hansson; Lars Rymell

doi:10.1117/12.371104

23 November 1999 Liquid-target laser-plasma sources for EUV and x-ray lithography

Hans M. Hertz, Magnus Berglund, Bjoern A. M. Hansson, Lars Rymell

Proceedings Volume 3767, EUV, X-Ray, and Neutron Optics and Sources; (1999) https://doi.org/10.1117/12.371104
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid drops or liquid jets as target. It is shown that such sources provide practically debris-free, high-flux operation at wavelengths suitable for EUV and x-ray lithography. This regenerative and liquid- density target system holds promise for high-average power x- ray and EUV generation using high-repetition-rate lasers. Application of the method to compact x-ray microscopy is also briefly discussed.

Citation Download Citation

Hans M. Hertz, Magnus Berglund, Bjoern A. M. Hansson, and Lars Rymell "Liquid-target laser-plasma sources for EUV and x-ray lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371104

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