Application of attenuated phase-shift masks to sub-0.18-um logic patterns

Michael Fritze; Peter W. Wyatt; David K. Astolfi; Paul Davis; Andrew V. Curtis; Douglas M. Preble; Susan G. Cann; Sandy Denault; David Y. Chan; Joe C. Shaw; Neal T. Sullivan; Robert Brandom; Martin E. Mastovich

doi:10.1117/12.388955

5 July 2000 Application of attenuated phase-shift masks to sub-0.18-μm logic patterns

Michael Fritze, Peter W. Wyatt, David K. Astolfi, Paul Davis, Andrew V. Curtis, Douglas M. Preble, Susan G. Cann, Sandy Denault, David Y. Chan, Joe C. Shaw, Neal T. Sullivan, Robert Brandom, Martin E. Mastovich

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388955
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In this work, we explore the application of attenuated phase-shift masks (APSM) to sub-0.18 micrometers logic patterning. Particular attention is paid to proximity effects and the common process corridor between dense and isolated features, a key challenge of logic-level lithography. Using PROLITH simulation, we evaluate APSM performance as a function of mask transmission and stepper illumination mode. The optimum process window was found for weak quadrupole illumination. Experimental results were obtained using a test mask consisting of sub-0.25 micrometers L/S Lbar patterns with various pitch values. We compared the case of a 6 percent APSM mask with weak quadrupole illumination to a standard chrome mask with conventional illumination. Properly optimized, APSM can add significant process latitude for sub-0.18micrometers logic features and may enable 130 nm logic node lithography on standard 248 nm exposure tools.

Citation Download Citation

Michael Fritze, Peter W. Wyatt, David K. Astolfi, Paul Davis, Andrew V. Curtis, Douglas M. Preble, Susan G. Cann, Sandy Denault, David Y. Chan, Joe C. Shaw, Neal T. Sullivan, Robert Brandom, and Martin E. Mastovich "Application of attenuated phase-shift masks to sub-0.18-μm logic patterns", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388955

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available