New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Pierre Boher; Patrick Evrard; Jean-Philippe Piel; Jean-Louis P. Stehle

doi:10.1117/12.405821

2 November 2000 New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Jean-Louis P. Stehle

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405821
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Spectroscopic ellipsometry has long been recognized as the technique of choice to characterize thin films and multi layers. Instrumentation for the next generation of UV lithography at 157nm requires special optical set-up since O₂ and H₂O are extremely absorbing below 190nm. The new system works into a purged glove box to reduce the oxygen and water contamination in the part per million range. The optical set-up includes a premonochromator in the polarizer arm to avoid photo bleaching. The system works in rotating analyzer configuration to minimize the parasitic polarizations. Ellipsometric and photometric measurement versus wavelength from 145 up to 630 nm and angle of incidence can be performed. The proposed paper will present in details the new system with some first experimental results in the field of micro lithography. Results are compared to those obtained with more standard UV ellipsometers and correlated to other measurements obtained with grazing x-ray reflectance technique.

Citation Download Citation

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, and Jean-Louis P. Stehle "New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405821

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available