Development problems of a nanometer coordinate measuring machine (NCMM)

Ralph Petersen; Hendrik Rothe

doi:10.1117/12.401663

26 September 2000 Development problems of a nanometer coordinate measuring machine (NCMM)

Ralph Petersen, Hendrik Rothe

Proceedings Volume 4100, Scattering and Surface Roughness III; (2000) https://doi.org/10.1117/12.401663
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Most probably scanning probe microscopy will play a key role in surface characterization while entering the nanotechnology era. Today, however, nearly all SPMs have only scan ranges up to 100 micrometers x 100 micrometers . The production of microsystems with nano-structured elements requires measuring instruments with extremely high resolutions and working areas in millimeter range. Therefore, a Nanometer Coordinate Measuring Machine (NCMM) with a working volume of at least 10 x 10 x 5 mm³ will be developed. We have to make great demands on the positioning system in this case, especially the design of the control algorithms is very critical. An electromechanical model of the xyz-positioning system shall support the optimization of the controllers. This paper describes some problems of the development of a NCMM. First simulation results will be discussed in short. Results of measuring the dynamic behaviour of the xyz-positioning system describe the observed difficulties of positioning in different orders of magnitude (nm - micrometers - mm).

Citation Download Citation

Ralph Petersen and Hendrik Rothe "Development problems of a nanometer coordinate measuring machine (NCMM)", Proc. SPIE 4100, Scattering and Surface Roughness III, (26 September 2000); https://doi.org/10.1117/12.401663

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