Feed-forward control for a lithography/etch sequence

Richard Oechsner; Thomas Tschaftary; Stefan Sommer; Lothar Pfitzner; Heiner Ryssel; Harald Gerath; Christine Baier; Martin Hafner

doi:10.1117/12.410080

23 August 2000 Feed-forward control for a lithography/etch sequence

Richard Oechsner, Thomas Tschaftary, Stefan Sommer, Lothar Pfitzner, Heiner Ryssel, Harald Gerath, Christine Baier, Martin Hafner

Author Affiliations +

Proceedings Volume 4182, Process Control and Diagnostics; (2000) https://doi.org/10.1117/12.410080
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

Feed-forward and feedback control are used to compensate for variations caused by processes or equipment. The variations may be due to e.g. aging or shift and they may occur within a single process step or within a process sequence. The application of advanced process control methods offer the possibility to reduce deviation of process centering and, therefore, improving process capability. In this work, we investigated the feed-forward concept applied for a lithography/etch sequence to control the deviation of the critical dimension of polysilicon wires and also the implementation of feed-forward control into existing manufacturing execution systems.

Citation Download Citation

Richard Oechsner, Thomas Tschaftary, Stefan Sommer, Lothar Pfitzner, Heiner Ryssel, Harald Gerath, Christine Baier, and Martin Hafner "Feed-forward control for a lithography/etch sequence", Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); https://doi.org/10.1117/12.410080

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