Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach

Marc D. Himel; Robert E. Hutchins; Jamey C. Colvin; Menelaos K Poutous; Alan D. Kathman; Adam S. Fedor

doi:10.1117/12.435682

14 September 2001 Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach

Marc D. Himel, Robert E. Hutchins, Jamey C. Colvin, Menelaos K Poutous, Alan D. Kathman, Adam S. Fedor

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435682
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

As CDs continue to shrink, lithographers are moving more towards using off-axis illumination schemes to increase their CD budget. There have been several papers over the last few years describing various custom illumination profiles designed for application specific optimization. These include various annular and quadrupole illumination schemes including weak quadrupole, CQUEST, and Quasar^TM. Traditionally, pupil filtering is used to realize these complex illumination modes but this approach tends to introduce significant light loss. Therefore, compromises are made to lithographic performance to minimize the effect on wafer throughput. Diffractive optics, if incorporated into the design of the illumination system, can be used to create arbitrary illumination profiles without the associated light loss, thus maintaining throughput while optimizing system performance. We report on the design and fabrication of such devices for use with KrF, ArF, and potentially F₂ scanners. Extension to I-line steppers is also possible.

Citation Download Citation

Marc D. Himel, Robert E. Hutchins, Jamey C. Colvin, Menelaos K Poutous, Alan D. Kathman, and Adam S. Fedor "Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435682

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available