Proximity printing by wave-optically designed masks

Frank Wyrowski; Ernst-Bernhard Kley; Sven Buehling; Ton J.M. Nellissen; Lingli Wang; Maarten Dirkzwager

doi:10.1117/12.451293

21 December 2001 Proximity printing by wave-optically designed masks

Frank Wyrowski, Ernst-Bernhard Kley, Sven Buehling, Ton J.M. Nellissen, Lingli Wang, Maarten Dirkzwager

Proceedings Volume 4436, Wave-Optical Systems Engineering; (2001) https://doi.org/10.1117/12.451293
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Photolithography based on proximity printing offers a high throughput and cost effective patterning technology for production of for instance large area liquid crystal displays. The resolution of this technique is limited due to wave-optical effects in the proximity gap between the binary amplitude mask and the substrate. We can improve the resolution drastically by replacing the conventional photomask with a mask causing both amplitude and phase modulation of the illumination wave. We describe a wave-optical design procedure of such masks. The feasibility of the method is demonstrated by results from computer simulations and practical experiments. We show that for a 50 micron gap a 3 micron line/space pattern is resolved clearly for visible light illumination, whereas under conventional conditions the image is completely degraded. The proximity mask used in our experiments was fabricated by e-beam lithography with four height levels and two amplitude transmission values.

Citation Download Citation

Frank Wyrowski, Ernst-Bernhard Kley, Sven Buehling, Ton J.M. Nellissen, Lingli Wang, and Maarten Dirkzwager "Proximity printing by wave-optically designed masks", Proc. SPIE 4436, Wave-Optical Systems Engineering, (21 December 2001); https://doi.org/10.1117/12.451293

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