Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

David R. Medeiros; Karen E. Petrillo; James Bucchignano; Marie Angelopoulos; Wu-Song Huang; Wenjie Li; Wayne M. Moreau; Robert Lang; Ranee W. Kwong; Christopher Magg; Brian Ashe

doi:10.1117/12.458334

11 March 2002 Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

David R. Medeiros, Karen E. Petrillo, James Bucchignano, Marie Angelopoulos, Wu-Song Huang, Wenjie Li, Wayne M. Moreau, Robert Lang, Ranee W. Kwong, Christopher Magg, Brian Ashe

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458334
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

The performance of KRS-XE, a low activation energy, chemically amplified resist designed specifically for mask making with electron beam lithography, has been extended in terms of its sensitivity, coated-film stability and etch resistance. By careful manipulation of resist composition, high sensitivity formulations have been generated that will allow exposure doses of less than 10 mC/cm2 with 50 keV electron beam tools. This sensitivity enhancement has been achieved without sacrificing the robust process latitude previously reported for this resist. The performance of this resist can be maintained, even in coated film form, for prolonged periods of time by careful packaging of the coated films. Additionally, formulations with etch resistance versus chlorine/oxygen plasma in excess of that of novolak-based resists have been generated by the incorporation of organometallic additives. The combination of these improvements leads to resist formulations that will allow the high resolution and throughput that is demanded for state-of-the art mask making applications.

Citation Download Citation

David R. Medeiros, Karen E. Petrillo, James Bucchignano, Marie Angelopoulos, Wu-Song Huang, Wenjie Li, Wayne M. Moreau, Robert Lang, Ranee W. Kwong, Christopher Magg, and Brian Ashe "Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458334

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