Fluoropolymer resists for 157-nm lithography

Minoru Toriumi; Naomi Shida; Hiroyuki Watanabe; Tamio Yamazaki; Seiichi Ishikawa; Toshiro Itani

doi:10.1117/12.474218

24 July 2002 Fluoropolymer resists for 157-nm lithography

Minoru Toriumi, Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474218
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Fluoropolymers are key materials for single-layer resists in 157-nm lithography. We investigated main-chain fluorinated polymers and found that the incorporation of fluorine atoms into polymer backbones such as that in tetrafluoroethylene and monocyclic monomers reduced their absorption coefficients to less than 1 micrometers ^-1 at 157 nm, while side-chain fluorinated polymers had absorption coefficients of 2 to 3 micrometers ^-1. The main-chain fluorinated polymers also showed good solubility in a standard alkaline developer and their dry-etching resistance was comparable to that of a ArF resist. Prototype positive-tone resists had good sensitivities of less than 10 mJ/cm², and they exhibited fine imaging resolution with 80-nm dense patterns. The resists can be used to obtain 300-nm-thick films.

Citation Download Citation

Minoru Toriumi, Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, and Toshiro Itani "Fluoropolymer resists for 157-nm lithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474218

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