Patterning biomolecules and cells: an upside-down microlithography

Dan V. Nicolau

doi:10.1117/12.474213

24 July 2002 Patterning biomolecules and cells: an upside-down microlithography

Dan V. Nicolau

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474213
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Spatially addressable immobilization of biomolecules and cells on patterned surfaces and microfabricated topographies has gained momentum in recent years. One major driving force behind this new impetus was the emergence of combinatorial DNA, protein and -soon- cell-based chips. The recent advances in New Generation Lithographies (NGL) as members with full rights in the panoply of microlithography techniques, automatically opened enormously large opportunities for microlithography engineering in the area of microarrays, which can be now seen as patterned chips. Despite all of these developments and related -yet to be fulfilled- opportunities, many other remained almost entirely unexplored. For instance, the intrinsic capability of the microlithographic materials -resists- to manipulate the surface properties via exposure to light has not been used for the patterning of biomolecules or cells. Also, other areas of classical microlithographic expertise, e.g. yield management, registration and alignment, and resolution enhancement are in many senses undiscovered by the bio-techniques for biomolecular and cellular patterning. This contribution will explore these hidden opportunities review the state of the art of biomolecular and cellular patterning through the glasses of a microlithographic engineer and it will explore the future areas where microlithography can contribute with the highest scientific, technical and commercial return-on-investment.

Citation Download Citation

Dan V. Nicolau "Patterning biomolecules and cells: an upside-down microlithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474213

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