Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO2 substrates

Luiz Goncalves Neto; Giuseppe Antonio Cirino; Ronaldo Domingues Mansano; Patricia S.P. Cardona; Patrick Verdonck

doi:10.1117/12.477830

17 January 2003 Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO₂ substrates

Luiz Goncalves Neto, Giuseppe Antonio Cirino, Ronaldo Domingues Mansano, Patricia S.P. Cardona, Patrick Verdonck

Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477830
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

A hybrid phase and amplitude modulation proximity printing mask was designed, manufactured and tested. The proposed diffractive structure modulates both the phase and the amplitude of a UV exposure beam. In the fused silica substrate a relief is generated in order to modulate the phase and a patterned diamond like carbon layer modulates the amplitude of the UV light. Besides, the diamond like carbon thin film is partially transparent at wavelengths larger than 400 nm, what improves the alignment procedures between different mask levels. The lithographic image was projected onto a resist coated silicon wafer, placed at a distance of 50 micrometer behind the mask, obtaining a resolution better than 1 micrometer, what is impossible with traditional proximity printing techniques.

Citation Download Citation

Luiz Goncalves Neto, Giuseppe Antonio Cirino, Ronaldo Domingues Mansano, Patricia S.P. Cardona, and Patrick Verdonck "Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO₂ substrates", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.477830

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