Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography

Masayuki Shiraishi; Noriaki Kandaka; Katsuhiko Murakami

doi:10.1117/12.484436

16 June 2003 Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography

Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484436
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We fabricated molybdenum (Mo)/silicon (Si) multilayers with a low-pressure rotary magnet cathode (RMC) sputtering system under several deposition conditions and investigated their properties. We obtained a high extreme UV (EUV) reflectivity of approximately 71% as measured in Mo/Si multilayers sputtered with low-pressure xenon (Xe) gas. We confirmed that the multilayers sputtered with Xe gas exhibited higher reflectivity than those sputtered with argon (Ar) gas, and that the multilayers sputtered at a lower pressure exhibited higher reflecitivty than those sputtered at a higher pressure. From trans mission electron microscope (TEM) cross-sectional images of the high-reflectivity Mo/Si multilayers, we observed thinner interdiffusion layers between the Mo and Si layers than those in Mo/Si multilayer where a 50-pair multilayer with a Γ ratio (the fractional thickness ratio of a Mo layer to the total thickness of a Mo layer and a Si layer) of 0.35 with compressive stress was stacked upon a 30-pair multilaeyr with a Γ ratio of 0.7 with tensile stress.

Citation Download Citation

Masayuki Shiraishi, Noriaki Kandaka, and Katsuhiko Murakami "Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484436

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available