Dr. Katsuhiko Murakami
Visiting Professor at Osaka Univ
SPIE Involvement:
Author
Publications (54)

Proceedings Article | 23 March 2012 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Yoshio Kawabe, Takuro Ono, Noriaki Kandaka, Atsushi Yamazaki, Takashi Yamaguchi, Ryo Shibata, Masayuki Shiraishi
Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676
KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

Proceedings Article | 6 April 2011 Paper
M. Shiraishi, T. Yamaguchi, A. Yamazaki, N. Kandaka, T. Oshino, K. Murakami
Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392
KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

Proceedings Article | 5 April 2011 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo
Proceedings Volume 7969, 79690P (2011) https://doi.org/10.1117/12.879305
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Mirrors, Carbon, Synchrotrons, Wavefront metrology, Oxygen, Optical design, Transmittance

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472
KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

Proceedings Article | 23 March 2010 Paper
K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata
Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676
KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

Proceedings Article | 20 March 2010 Paper
Takaharu Miura, Katsuhiko Murakami, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo
Proceedings Volume 7636, 76361G (2010) https://doi.org/10.1117/12.846459
KEYWORDS: Extreme ultraviolet lithography, Projection systems, Mirrors, Extreme ultraviolet, Lithography, Light sources, Carbon, Reflectivity, Lithographic illumination, Coating

SPIE Journal Paper | 1 October 2009
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa
JM3, Vol. 8, Issue 04, 041507, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238522
KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

Proceedings Article | 18 March 2009 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa
Proceedings Volume 7271, 72711Z (2009) https://doi.org/10.1117/12.813638
KEYWORDS: Projection systems, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Eye, Resolution enhancement technologies, Reflectivity, Polishing, Aspheric optics

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72713R (2009) https://doi.org/10.1117/12.813640
KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Ions, Silicon, Light sources, Extreme ultraviolet lithography, Metals, Titanium dioxide, Oxidation

Proceedings Article | 18 March 2009 Paper
Takaharu Miura, Katsuhiko Murakami, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo
Proceedings Volume 7271, 72711X (2009) https://doi.org/10.1117/12.813384
KEYWORDS: Extreme ultraviolet lithography, Projection systems, Extreme ultraviolet, Carbon, Mirrors, Light sources, Wavefronts, Lithography, Photomasks, Contamination control

Proceedings Article | 4 December 2008 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo, Takaharu Miura
Proceedings Volume 7140, 71401C (2008) https://doi.org/10.1117/12.804706
KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, Lithography, Polishing, Aspheric optics, Multilayers, Optical design

Proceedings Article | 26 March 2008 Paper
Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo, Hidemi Kawai
Proceedings Volume 6921, 69210M (2008) https://doi.org/10.1117/12.772444
KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reflectivity, Light sources, EUV optics, Photomasks, Extreme ultraviolet, Lithography, Reticles, Line edge roughness

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624
KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958
KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

Proceedings Article | 20 March 2008 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata
Proceedings Volume 6921, 69210Q (2008) https://doi.org/10.1117/12.772435
KEYWORDS: Projection systems, Mirrors, Wavefronts, Polishing, Extreme ultraviolet, Point spread functions, Multilayers, Optical coatings, Extreme ultraviolet lithography, Reflection

Proceedings Article | 21 March 2007 Paper
S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. Fukuda
Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816
KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

Proceedings Article | 15 March 2007 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata
Proceedings Volume 6517, 65170J (2007) https://doi.org/10.1117/12.711738
KEYWORDS: Mirrors, Projection systems, Coating, Polishing, Eye, Wavefronts, Extreme ultraviolet lithography, Multilayers, Aspheric optics, Wavefront metrology

Proceedings Article | 13 March 2007 Paper
Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo
Proceedings Volume 6517, 651707 (2007) https://doi.org/10.1117/12.711267
KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reticles, Light sources, Reflectivity, Extreme ultraviolet, Photomasks, EUV optics, Wavefront sensors, Semiconducting wafers

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845
KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089
KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039
KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240
KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

Proceedings Article | 10 March 2006 Paper
Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Yukiharu Ohkubo, Takeshi Asami
Proceedings Volume 6151, 615105 (2006) https://doi.org/10.1117/12.656243
KEYWORDS: Extreme ultraviolet lithography, Reticles, Mirrors, Projection systems, Coating, Reflectivity, Polishing, Particles, EUV optics, Surface finishing

Proceedings Article | 17 September 2005 Paper
Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676
KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456
KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274
KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468
KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435
KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

Proceedings Article | 18 October 2004 Paper
Tetsuya Oshino, Shin-ichi Takahashi, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki
Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210
KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

Proceedings Article | 18 October 2004 Paper
Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431
KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536075
KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Silicon, Extreme ultraviolet lithography, Surface roughness, Xenon, Microcrystalline materials

Proceedings Article | 20 May 2004 Paper
Tetsuya Oshino, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Isa Nishiyama, Shinji Okazaki
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365
KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344
KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331
KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327
KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

Proceedings Article | 13 January 2004 Paper
Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.508116
KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Silicon, Extreme ultraviolet, Xenon, Interfaces, Extreme ultraviolet lithography, Argon

Proceedings Article | 13 January 2004 Paper
Katsura Otaki, Yucong Zhu, Mikihiko Ishii, Shigeru Nakayama, Katsuhiko Murakami, Takashi Gemma
Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.507046
KEYWORDS: Wavefronts, Mirrors, Point diffraction interferometers, Extreme ultraviolet lithography, Diffraction, Error analysis, Projection systems, Numerical simulations, Wavefront analysis, Computer simulations

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936
KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484436
KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Xenon, Silicon, Argon, Extreme ultraviolet lithography, Ions

Proceedings Article | 16 June 2003 Paper
Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935
KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

Proceedings Article | 1 July 2002 Paper
Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472329
KEYWORDS: Molybdenum, Silicon, Argon, Chemical species, Sputter deposition, Ions, Oxides, Ion beams, Oxygen, Extreme ultraviolet lithography

Proceedings Article | 20 December 2001 Paper
Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450945
KEYWORDS: Molybdenum, Multilayers, Silicon, Ion beams, Sputter deposition, Polishing, Ions, Reflectivity, Ruthenium, Interfaces

Proceedings Article | 20 August 2001 Paper
Noriaki Kandaka, Hiroyuki Kondo, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714
KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

Proceedings Article | 20 August 2001 Paper
Kazuya Ota, Katsuhiko Murakami, Hiroyuki Kondo, Tetsuya Oshino, Katsumi Sugisaki, Hideki Komatsuda
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704
KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 20 August 2001 Paper
Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436713
KEYWORDS: Molybdenum, Silicon, Capacitance, Capacitors, Multilayers, Electrodes, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Semiconducting wafers

Proceedings Article | 2 November 2000 Paper
Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami
Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906
KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114
KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122
KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091
KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390102
KEYWORDS: Multilayers, Ion beams, Polishing, Interfaces, Sputter deposition, Reflectivity, Mirrors, Molybdenum, Argon, Extreme ultraviolet lithography

Proceedings Article | 5 June 1998 Paper
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580
KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

Proceedings Article | 11 July 1997 Paper
Shin'ichi Nagata, Hirohisa Hara, Taro Sakao, Toshifumi Shimizu, Saku Tsuneta, Tsuyoshi Yoshida, Wakana Ishiyama, Katsuhiko Murakami, Tetsuya Oshino
Proceedings Volume 3113, (1997) https://doi.org/10.1117/12.278847
KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Doppler effect, Photomasks, Telescopes, Plasma, Silicon, Space telescopes

Proceedings Article | 25 November 1996 Paper
Taro Sakao, Saku Tsuneta, Hirohisa Hara, Ryouhei Kano, Tsuyoshi Yoshida, Shin'ichi Nagata, Toshifumi Shimizu, Takeo Kosugi, Katsuhiko Murakami, Wakuna Wasa, Masao Inoue, Katsuhiro Miura, Koji Taguchi, Kazuo Tanimoto
Proceedings Volume 2804, (1996) https://doi.org/10.1117/12.259721
KEYWORDS: Mirrors, Telescopes, Space telescopes, Extreme ultraviolet, Rockets, Charge-coupled devices, Multilayers, Doppler effect, Solar processes, Coronagraphy

Proceedings Article | 21 January 1993 Paper
Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, Masayuki Ohtani, Hiroshi Nagata
Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140572
KEYWORDS: Silicon, Reflectivity, Molybdenum, Sputter deposition, X-rays, Ion beams, Interfaces, Transmission electron microscopy, Chemical species, Analytical research

Showing 5 of 54 publications
Conference Committee Involvement (3)
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
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