Dr. Katsuhiko Murakami
Visiting Professor at Osaka Univ
SPIE Involvement:
Author
Publications (54)

Proceedings Article | 23 March 2012 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Yoshio Kawabe, Takuro Ono, Noriaki Kandaka, Atsushi Yamazaki, Takashi Yamaguchi, Ryo Shibata, Masayuki Shiraishi
Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676
KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

Proceedings Article | 6 April 2011 Paper
M. Shiraishi, T. Yamaguchi, A. Yamazaki, N. Kandaka, T. Oshino, K. Murakami
Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392
KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

Proceedings Article | 5 April 2011 Paper
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo
Proceedings Volume 7969, 79690P (2011) https://doi.org/10.1117/12.879305
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Mirrors, Carbon, Synchrotrons, Wavefront metrology, Oxygen, Optical design, Transmittance

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472
KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

Proceedings Article | 23 March 2010 Paper
K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata
Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676
KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

Showing 5 of 54 publications
Conference Committee Involvement (3)
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
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