Development of attenuating PSM shifter for F<sub>2</sub> and high-transmission ArF lithography

Osamu Nozawa; Yuki Shiota; Hideaki Mitsui; Toshiyuki Suzuki; Yasushi Ohkubo; Masao Ushida; Satoshi Yusa; Toshiharu Nishimura; Kenji Noguchi; Shiho Sasaki; Hiroshi Mohri; Naoya Hayashi

doi:10.1117/12.504047

28 August 2003 Development of attenuating PSM shifter for F₂ and high-transmission ArF lithography

Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi

Author Affiliations +

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504047
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

A new att-PSM shifter for both F₂ and high-transmittance ArF lithography was developed. This shifter consists of SiON / TaHf in stacked layers. SiON for phase shift layer has a moderate transmittance and refractive index, and has sufficient laser durability. The TaHf film, which is a transmittance control layer, was effective as a functional layer in mask dry etching. Adopting the 3 step etching procedure, low damage of the quartz surface and less impact to CD shift was realized. It was confirmed that a new shifter has also sufficient feasibility to the mask inspection and repair process.

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Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, and Naoya Hayashi "Development of attenuating PSM shifter for F₂ and high-transmission ArF lithography", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504047

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