Measuring thermal expansion variations in ULE glass with interferometry

Brian L. Harper; Kenneth E. Hrdina; W. David Navan; Joseph Ellison; Andrew Fanning

doi:10.1117/12.535133

20 May 2004 Measuring thermal expansion variations in ULE glass with interferometry

Brian L. Harper, Kenneth E. Hrdina, W. David Navan, Joseph Ellison, Andrew Fanning

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.535133
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Corning has focused its recent efforts on coefficient of thermal expansion (CTE) metrology improvements. Due to the unique environment required for EUVL technology, EUVL optics (and photomasks) require extremely uniform CTE properties, with targeted variations of less than 1ppb/K. Until now, no practical metrology technique existed that could accurately verify if a material met such requirements due to the lack of precision. Corning has previously introduced the idea of measuring CTE in ULE (registered trademark) Glass using Phase Measuring Interferometry (PMI) by discovering the correlation between refractive index and CTE in ULE (registered trademark) Glass. However, refinement of the correlation was necessary. This paper focuses on the progress made towards that end, which has resulted in the ability to non-destructively measure peak to valley CTE variations to within 57 parts per trillion per degree Kelvin (ppt/K) at possible spatial resolutions in the micron range on thick or thin samples.

Citation Download Citation

Brian L. Harper, Kenneth E. Hrdina, W. David Navan, Joseph Ellison, and Andrew Fanning "Measuring thermal expansion variations in ULE glass with interferometry", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535133

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