Subatomic accuracy in EUVL multilayer coatings

Erwin Zoethout; P. Suter; R. W.E. van de Kruijs; Andrey E. Yakshin; Eric Louis; Fred Bijkerk; H. Enkisch; Stefan Muellender

doi:10.1117/12.561319

20 May 2004 Subatomic accuracy in EUVL multilayer coatings

Erwin Zoethout, P. Suter, R. W.E. van de Kruijs, Andrey E. Yakshin, Eric Louis, Fred Bijkerk, H. Enkisch, Stefan Muellender

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.561319
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Reported is the production of multilayer EUV coatings on 25000 mm² large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

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Erwin Zoethout, P. Suter, R. W.E. van de Kruijs, Andrey E. Yakshin, Eric Louis, Fred Bijkerk, H. Enkisch, and Stefan Muellender "Subatomic accuracy in EUVL multilayer coatings", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.561319

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