Paper
24 May 2004 New technique to reconstruct effective 3D profile from tilt images of CD-SEM
Hidetoshi Morokuma, Atsushi Miyamoto, Maki Tanaka, Masato Kazui, Atsushi Takane
Author Affiliations +
Abstract
This study presents a new and unique method to reconstruct 3D profile from tilt images of SEM for semiconductor device pattern called 'Inverse Stereo Matching'. This method is based on 'the shape from shading' and it’s more stable than the conventional stereo matching method in case of low S/N in sidewall of tilt images, and it is able to reconstruct gradual change of sidewall shape that is difficult for the conventional stereo matching to reconstruct in detail. Additionally, this study presents a new method using 'MPPC Indices' to compensate errors of local shape in reconstruction 3D profile caused by the particular characteristic of secondary electron.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hidetoshi Morokuma, Atsushi Miyamoto, Maki Tanaka, Masato Kazui, and Atsushi Takane "New technique to reconstruct effective 3D profile from tilt images of CD-SEM", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.536445
Lens.org Logo
CITATIONS
Cited by 14 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
3D image processing

3D image reconstruction

3D modeling

Scanning electron microscopy

Error analysis

Reconstruction algorithms

Edge detection

Back to Top