193-nm negative resist based on acid-catalyzed elimination of polar molecules

Ratnam Sooriyakumaran; Blake W. Davis; Carl E. Larson; Phillip J. Brock; Richard A. DiPietro; Thomas I. Wallow; Eric F. Connor; Linda K. Sundberg; Gregory Breyta; Robert D. Allen; Kaushal S. Patel; Pushkara Rao Varanasi

doi:10.1117/12.536432

14 May 2004 193-nm negative resist based on acid-catalyzed elimination of polar molecules

Ratnam Sooriyakumaran, Blake W. Davis, Carl E. Larson, Phillip J. Brock, Richard A. DiPietro, Thomas I. Wallow, Eric F. Connor, Linda K. Sundberg, Gregory Breyta, Robert D. Allen, Kaushal S. Patel, Pushkara Rao Varanasi

Author Affiliations +

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.536432
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Development of 193-nm negative resists that meet the stringent performance requirements of sub-100 nm resolution with conventional 0.26 N TMAH developer has proven to be a significant challenge. Most of the systems that are currently under development are based on cross-linking mechanisms. They commonly suffer from image distortion caused by micro-bridging. An alternative approach is to look at polarity switch mechanisms. We have investigated the acid-catalyzed elimination of polar molecules as one such mechanism which may provide a pathway to develop negative resists that do not suffer from micro-bridging.

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Ratnam Sooriyakumaran, Blake W. Davis, Carl E. Larson, Phillip J. Brock, Richard A. DiPietro, Thomas I. Wallow, Eric F. Connor, Linda K. Sundberg, Gregory Breyta, Robert D. Allen, Kaushal S. Patel, and Pushkara Rao Varanasi "193-nm negative resist based on acid-catalyzed elimination of polar molecules", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.536432

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