Nano-scale dimensional focused ion beam repair of quartz defects on 90 nm node alternating aperture phase shift masks

Tod E. Robinson; Anthony Graupera; Troy B. Morrison; Marcus Ramstein

doi:10.1117/12.557737

20 August 2004 Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks

Tod E. Robinson, Anthony Graupera, Troy B. Morrison, Marcus Ramstein

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557737
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

The effort to produce perfect dimension repairs of quartz bump defects on Alternating-Aperture Phase Shift Masks (AAPSM) has been brought to a new level with process developments to meet 90 nm technology node specifications. Decreasing photomask line and space dimensions pushes performance requirements for a mask repair system in terms of fine control in difficult to access structures on the mask surface. New repair strategies using a recently improved focused ion beam mask repair system for different defect types are discussed, along with their relative effectiveness. These strategies are then applied to the repair of full height extension and bridging defects in a line and space array. The role of quartz topography and its optical effects, Cr edge bias, and the combination of both strategies in a quartz bump repair are discussed. Additionally, effective process controls in repair are also discussed, along with analysis of metrology data received from a stylus nano-profilometer (SNP) system, and their relationship to potential imaging on the wafer by examination of AIMS data at a high numerical aperture. Several possible mask repair process flows are also reviewed in light of this work.

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Tod E. Robinson, Anthony Graupera, Troy B. Morrison, and Marcus Ramstein "Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557737

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