Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV

Timm Weitkamp; Olivier Dhez; Burkhard Kaulich; Christian David

doi:10.1117/12.559704

4 November 2004 Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV

Timm Weitkamp, Olivier Dhez, Burkhard Kaulich, Christian David

Proceedings Volume 5539, Design and Microfabrication of Novel X-Ray Optics II; (2004) https://doi.org/10.1117/12.559704
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

In the framework of TWINMIC, a project for the development of a multipurpose compact X-ray microscopy station capable of both scanning and full-field imaging, fabrication methods for tantalum zone plates are being developed at the Laboratory for Micro- and Nanotechnology of the Paul Scherrer Institut. Tantalum is deposited on supporting silicon or silicon nitride membranes by magnetron sputtering. The zone-plate patterns are transferred into the tantalum layer by reactive ion etching. Electron-beam lithography with continuous path control using a Leica LION LV1 e-beam machine has been used to make zone plates with diameters between 250 and 500 μm and thicknesses between 200 and 300 nm, all with an outermost zone width of 80 nm.

Citation Download Citation

Timm Weitkamp, Olivier Dhez, Burkhard Kaulich, and Christian David "Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV", Proc. SPIE 5539, Design and Microfabrication of Novel X-Ray Optics II, (4 November 2004); https://doi.org/10.1117/12.559704

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