Low-loss ridge Ti:LiNbO<sub>3</sub> waveguides fabrication

Vadim Dobrusin; Shlomo Ruschin

doi:10.1117/12.581088

20 December 2004 Low-loss ridge Ti:LiNbO₃ waveguides fabrication

Vadim Dobrusin, Shlomo Ruschin

Proceedings Volume 5577, Photonics North 2004: Optical Components and Devices; (2004) https://doi.org/10.1117/12.581088
Event: Photonics North, 2004, Ottawa, Ontario, Canada

Abstract

In this work we discuss a method of smooth waveguide fabrication by wet etching, using a novel mixture of organic and inorganic acids. We fabricated 4.5μm-deep large single mode waveguides with walls and edges roughness comparable with the roughness of non-etched regions. Surface and wall roughness as well as etching rates and propagation losses are presented and compared to characteristics achieved by traditional wet etching recipes. The method was developed as part of the effort to implement fast and widely tunable AWG-based wavelength filter with channel spacing suitable for dense WDM networks.

Citation Download Citation

Vadim Dobrusin and Shlomo Ruschin "Low-loss ridge Ti:LiNbO₃ waveguides fabrication", Proc. SPIE 5577, Photonics North 2004: Optical Components and Devices, (20 December 2004); https://doi.org/10.1117/12.581088

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