Paper
29 December 2004 Low-energy electron beam irradiation promoted selective cleavage of surface furoxan
Chang Ok Kim, Jie Won Jung, Minju Kim, Tai-Hee Kang, Kyuwook Ihm, Ki-Jeong Kim, Bongsoo Kim, Joon Won Park, Hyun-Woo Nam, Kwang-Jin Hwang
Author Affiliations +
Proceedings Volume 5593, Nanosensing: Materials and Devices; (2004) https://doi.org/10.1117/12.570071
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
In the gas phase, electron beam irradiation of a furoxan molecule results in the production of two NO molecules and concomitant generation of a triple bond. In this study, we examined whether the selective cleavage of furoxan occurs on the surface of silicon wafers. A furoxan-substituted imine layer was prepared by the reaction of aminosilylated silicon wafers with 4-furoxancarbaldehyde. Formation of the imine layer was confirmed by UV-vis spectroscopy, contact angle goniometry, ellipsometry, and XPS. XPS spectroscopic monitoring of the electron beam (400 eV) induced reaction of the modified silicon wafers showed that two of the furoxan ring nitrogen atoms were lost. To determine if a carbon-carbon triple bond had been generated in the surface product of this reaction, FT-IR spectroscopy and NEXAFS (Near Edge X-ray Absorption Fine Structure) were performed. A weak absorption at 2203 cm-1 was observed in the FT-IR spectrum, reflecting the presence of a triple bond. The carbon K-edge NEXAFS spectrum contained a π*(C≡C) peak at 286.5 eV. Based on these results, we conclude that electron beam irradiation of the furoxan, incorporated on a silicon wafer surface, results in the release of nitrogen oxide and the formation of a triple bond containing product.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chang Ok Kim, Jie Won Jung, Minju Kim, Tai-Hee Kang, Kyuwook Ihm, Ki-Jeong Kim, Bongsoo Kim, Joon Won Park, Hyun-Woo Nam, and Kwang-Jin Hwang "Low-energy electron beam irradiation promoted selective cleavage of surface furoxan", Proc. SPIE 5593, Nanosensing: Materials and Devices, (29 December 2004); https://doi.org/10.1117/12.570071
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KEYWORDS
Silicon

Nitrogen

Semiconducting wafers

Electron beams

Gold

Carbon

Chemical species

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