Soft-imprint technique for 3D microstructures using poly(dimethylsiloxane) mold combined with a screen mask

Won Mook Choi; O Ok Park

doi:10.1117/12.576742

27 January 2005 Soft-imprint technique for 3D microstructures using poly(dimethylsiloxane) mold combined with a screen mask

Won Mook Choi, O Ok Park

Author Affiliations +

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.576742
Event: Photonics Asia, 2004, Beijing, China

Abstract

This article presents a microfabrication technology of 3D microstructures via the soft-imprint technique using poly(dimethylsiloxane) (PDMS) mold attached with a screen mask, TEM grid. A prepolymer and monomer mixture, after short UV exposure, rises only up to the open spot of TEM grid, sequentially into the groove of the PDMS mold, then, 3D microstructures are formed in one-step process. The unreacted remaining monomer enables the viscous prepolymer mixture to fill the cavity of TEM grid and the PDMS mold, and the conformal contact of the PDMS mold with TEM grid also prevents the permeation of sticky prepolymer into the interface of PDMS mold and TEM grid. The proposed technique is an inexpensive, simple, and reliable method to fabricate 3D microstructures without expensive and complex lithographic tools. Thus, using this 3D microfabrication method, various 3D microstructures of the combination of TEM grid pattern and PDMS mold groove are easily generated with good pattern fidelity.

Citation Download Citation

Won Mook Choi and O Ok Park "Soft-imprint technique for 3D microstructures using poly(dimethylsiloxane) mold combined with a screen mask", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.576742

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