Paper
28 February 2005 Fabrication of integrated lens pair test device
Author Affiliations +
Proceedings Volume 5649, Smart Structures, Devices, and Systems II; (2005) https://doi.org/10.1117/12.582391
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia
Abstract
A silica microlens has been proposed which can be integrated with planar optical waveguide circuits. In order to fabricate the microlens, two deep silica etches must be performed. RIE is the prefered process as under certain conditions it is anisotropic. This paper reports on a study of different masking materials and plasma etch conditions trialed for the deep silica etch.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark Mackenzie, Chee Yee Kwok, and G. D. Peng "Fabrication of integrated lens pair test device", Proc. SPIE 5649, Smart Structures, Devices, and Systems II, (28 February 2005); https://doi.org/10.1117/12.582391
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KEYWORDS
Etching

Chromium

Reactive ion etching

Silica

Photomasks

Waveguides

Plasma

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