Molecular vapor deposition (MVD) for improved SAM coatings

Boris Kobrin; Jeff Chinn; Robert William Ashurst; Roya Maboudian

doi:10.1117/12.592627

22 January 2005 Molecular vapor deposition (MVD) for improved SAM coatings

Boris Kobrin, Jeff Chinn, Robert William Ashurst, Roya Maboudian

Proceedings Volume 5716, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS IV; (2005) https://doi.org/10.1117/12.592627
Event: MOEMS-MEMS Micro and Nanofabrication, 2005, San Jose, California, United States

Abstract

This paper reports on the results of an improved surface modification method called Molecular Vapor Deposition (MVD). MVD allows for the creation of molecular organic coatings which are denser and more durable than those obtained by current liquid or vapor-phase methods. This improvement has been achieved using a “sequential” or “layered” vapor deposition scheme of two different molecular films. The first molecular coating is a “seed” or adhesion promoter layer which is used to increase the binding sites for the subsequent functional molecular layer. The resulting surface coatings were observed to have improved stability to immersion applications, higher temperature stability and overall improved durability as a result of the increased surface coverage when compared to standard self-assembled monolayers (SAMs). These new film capabilities will have significant importance in improving the functionality and reliability of many micro- and nano-scale devices. The sequential approach with the seed layer has also been used to deposit molecular coatings on a variety of substrate materials (such as polymers, plastics and metals) which normally do not allow high quality surface coatings.

Citation Download Citation

Boris Kobrin, Jeff Chinn, Robert William Ashurst, and Roya Maboudian "Molecular vapor deposition (MVD) for improved SAM coatings", Proc. SPIE 5716, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS IV, (22 January 2005); https://doi.org/10.1117/12.592627

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