EUV source system development update: advancing along the path to HVM

D. W. Myers; I. V. Fomenkov; B. A. M. Hansson; B. C. Klene; D. C. Brandt

doi:10.1117/12.601052

6 May 2005 EUV source system development update: advancing along the path to HVM

D. W. Myers, I. V. Fomenkov, B. A. M. Hansson, B. C. Klene, D. C. Brandt

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601052
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The EUV light source has been characterized as the top-priority critical issue facing the viability of EUV lithography. Cymer's extensive EUV source development efforts have focused both on the technical feasibility of various approaches as well as the critical issue of commercial feasibility to reach high volume manufacturing (HVM) requirements. We present a comprehensive summary of performance data from a state-of-the-art operational EUV source that thoroughly characterizes technical issues such as conversion efficiency, source material delivery, collector coatings, protection techniques and the path to higher and higher EUV power. Additionally, we present analysis of this performance data when compared to HVM requirements. Finally, we also briefly investigate the associated implications of the cost of consumables (COC) for a production EUV light source.

Citation Download Citation

D. W. Myers, I. V. Fomenkov, B. A. M. Hansson, B. C. Klene, and D. C. Brandt "EUV source system development update: advancing along the path to HVM", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601052

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