Paper
8 December 2004 High-isolation contact switch in MEMS phase shifter
Wei Li, Yanling Shi, Jian Qing, Ling Jiang, Zheng Ren, Peisheng Xin, Ziqiang Zhu, Zongshen Lai
Author Affiliations +
Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607790
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
The design, fabrication and testing of high-isolation contact MEMS switch using AlSi membrane on high-resistivity silicon substrates are described. Simulation result of the switch is analyzed and shows good performance. The measured results show that the isolation of the MEMS switch is better than -30dB at 0.05 - 5GHz. And it has not only low actuation voltage, but also the high reliability. So this contact MEMS switch can be widely used in MEMS phase shifters.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei Li, Yanling Shi, Jian Qing, Ling Jiang, Zheng Ren, Peisheng Xin, Ziqiang Zhu, and Zongshen Lai "High-isolation contact switch in MEMS phase shifter", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607790
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KEYWORDS
Microelectromechanical systems

Switches

Phase shifts

Bridges

Silicon

Signal attenuation

Electrodes

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