Optical analysis of scanning microstereolithography systems

Suhas P. Deshmukh; Shashikant Dubey; P. S. Gandhi

doi:10.1117/12.645856

23 January 2006 Optical analysis of scanning microstereolithography systems

Suhas P. Deshmukh, Shashikant Dubey, P. S. Gandhi

Proceedings Volume 6109, Micromachining and Microfabrication Process Technology XI; 61090C (2006) https://doi.org/10.1117/12.645856
Event: MOEMS-MEMS 2006 Micro and Nanofabrication, 2006, San Jose, California, United States

Abstract

Microstereolithography (MSL) is rapidly developing technique for micro-fabrication. Vector-by-vector scanning MSL has a potential to create true 3D micro-devices as compared to mostly planar (2D-2 1/2 D) devices fabricated by conventional MEMS techniques. Previous literature shows two different scanning methods:(1) Galvanomirror scanning, (2) Photoreactor tank scanning. Galvanomirror scanning technique has higher fabrication speed but poor resolution because of defocusing of laser spot on the resin surface. Photo-reactor tank scanning has higher resolution but produces a wavy structures and limited speed of fabrication. This paper proposes and develops an offaxis lens scanning technique for MSL and carries out optical analysis to compare its performance with the existing techniques mentioned above. The comparison clearly demonstrates improved performance with the proposed offaxis lens scanning technique.

Citation Download Citation

Suhas P. Deshmukh, Shashikant Dubey, and P. S. Gandhi "Optical analysis of scanning microstereolithography systems", Proc. SPIE 6109, Micromachining and Microfabrication Process Technology XI, 61090C (23 January 2006); https://doi.org/10.1117/12.645856

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