A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography

Ramil-Marcelo L. Mercado; Joyce A. Lowes; Carlton A. Washburn; Douglas J. Guerrero

doi:10.1117/12.712313

30 March 2007 A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography

Ramil-Marcelo L. Mercado, Joyce A. Lowes, Carlton A. Washburn, Douglas J. Guerrero

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65192X (2007) https://doi.org/10.1117/12.712313
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A novel approach to developer-soluble bottom anti-reflective coatings (BARCs) for 248-nm lithography was demonstrated. The BARC formulations are photosensitive, dye-filled systems incorporated with a polymer binder. The films are generated by thermally crosslinking the polymer matrix, and are then photochemically decrosslinked in order to render them soluble in developer solutions. The BARCs are compatible with solvents commonly used in the industry. Easy modification of the films with regard to optical properties for potential use with various substrates was also demonstrated. The BARCs exhibit anisotropic development in aqueous tetramethylammonium hydroxide (TMAH) solutions subsequent to simulated photoresist application, exposure, and post-exposure bake.

Citation Download Citation

Ramil-Marcelo L. Mercado, Joyce A. Lowes, Carlton A. Washburn, and Douglas J. Guerrero "A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192X (30 March 2007); https://doi.org/10.1117/12.712313

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